Installation of ion-plasma sputtering.
Installation of ion-plasma sputtering and coating “micro” is designed for applying the method of cathode-ion bombardment wear-resistant, corrosion-resistant, protective and decorative coatings (metals, nitrides, oxides, carbides etc.) in various metal products and a number of dielectrics.
Description:
Installation of ion-plasma sputtering and applying a cover “micro” is designed for applying the method of cathode-ion bombardment wear-resistant, corrosion-resistant, protective and decorative coatings (metal, nitrides, oxides, carbides etc.) in various metal products and a number of dielectrics.
Installation of ion-plasma sputtering is applied to industrial processing batches of small products and tools, as well as for scientific and technological research in the field of physics of plasma and coating, modifying surface properties of materials and development of those coatings.
Advantages:
– modern technical solutions,
– high reliability and ease of operation in comparison with analogues
– small size and modern design
– low energy and resource consumption over,
– saving supplies,
– relatively small time of process of coating.
– available in the installation source nizkotemperaturnoi gas plasma (source gas), allows you to perform additional in-camera cleaning products, which significantly improves the quality of the coating.
Specifications:
| Features: | Value: |
| Ultimate vacuum | Of 1.33×10-3 PA |
| The time to reach ultimate vacuum (no more) | 30 min. |
| The management of the unit from loading to unloading of the glass | software automatic |
| The deposition rate of titanium nitride | 3 – 6 microns/h |
| Current evaporator (continuously adjustable) | 40 – 60 A |
| Current source with low temperature gas plasma | 2 – 10 And |
| The voltage of the high voltage source | 50 – 1000 V |
| Power consumption, not more | 5.5 kW |
| Footprint | 9 m2 |
Note: the description of technology in example, the installation of ion-plasma sputtering and applying a cover “micro”.